ISTEQ Presents the TEUS EUV Light Source
ISTEQ introduces their latest products in the EUV light source — 13.5 nm TEUS (S100, S200 and S400) product line. These devices are based on laser-produced plasma (LPP) with extremely high brightness, low debris, and a high duty cycle.
Right now this is the only LPP EUV light source available worldwide for mask inspections and other critical EUVL testing applications.
The LPP EUV source is based on a fast rotating, liquid metal target. A novel LPP target with conventional debris mitigation techniques has resulted in an ultimate solution for a clean photon EUV source.
Fast rotation target provides:
- Redirection of droplet debris away from input (laser) and output (EUV) windows
- Undisturbed target surface for a high rep rate laser system (up to 1 MHz)
- Minimum synchronization required as the target is continuous
- Excellent inherent source spatial stability
To request more information or a quotation for this or other ISTEQ products, contact IL Photonics.