Uniform Illumination in Lithography and Inspection Systems
Many conventional lithography and inspection systems rely on uniform illumination. Illumination uniformity directly affects the integrity of line widths across the exposure field. Errors in uniformity can impact device quality and signal-to-noise ratio (SNR) in inspection systems.
To minimize these errors, Holo/Or designs and manufactures customized, high-performance beam shaping solutions, both diffractive and refractive. Additionally, Holo/Or can model the performance of their elements in your optical system, enabling seamless integration and offering insights into expected performance.
For more information, contact BizDev@holoor.co.il
About Holo/Or
Holo/Or develops, designs and manufactures diffractive optical elements (DOEs) and micro-optical elements for any wavelength, from DUV to far IR, as well as software/automation solutions for the design. If you are interested in DOEs for your application, contact Holo/Or.